In this video you'll learn the preferred KNI way to spin photoresist onto wafers and pieces using the KNI's Laurell brand spinners. You can learn more about using resists and lithography in the KNI on our Lab wiki, by visiting the Optical Lithography Resources page (https://bit.ly/2PUnkjW) and touring the Lithography Equipment (https://bit.ly/377Xf6U). Also see the KNI's Spinner Rules (https://bit.ly/2SpEAPU), a written SOP on how to clean the spinners (https://bit.ly/2QufwEP), and the Laurell Manuals (Lite Version: https://bit.ly/2QlkbZm & Long Version: https://bit.ly/2PVTFXD).

The video includes how to:
1. Select and verify a spin recipe (0:56)
2. Inspect and clean the spinner (1:40)
3. Spinclean the wafer and prebake (2:37)
4. Prepare wafer surface with HMDS, if necessary (3:55)
5. Load wafer onto chuck, apply resist, and spin (4:55)
6. Remove resist edge bead (6:30)
7. Postbake the wafer (7:22)
8. Clean the spinner (7:38)
9. Exchange in/out various vacuum chucks and adapters(9:23)
10. Spin resist onto a small piece (10:30)
11. Document the parameters of your run in the log book (13:07)
12. Replace a vacuum chuck or adapter oring, if necessary (13:50)
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Disclaimer: This video is intended to serve as supplemental information and cannot replace inperson instrument training. Caltech and KNI are not responsible for how the presented information is translated for use in other facilities.

For information or questions about this video, contact [email protected]